Wednesday 2 July 2014

Ultrathin silver films and lithographically patterned structures to enhance plasmonic performance

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Plasmonic devices—such as superlenses, hyperlenses and plasmonic waveguides—have exciting potential for research and commercial applications because they permit optical lithography, imaging and waveguiding to be performed at resolutions below the diffraction limit of light. These devices often require low-loss ultrathin metal films, which are difficult to fabricate using current deposition techniques. Researchers have investigated processes such as seed layer deposition and thermal annealing to reduce the surface roughness and grain-boundary density of these films. To date, however, these processes have not been hugely successful.



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