Friday, 5 September 2014

Researchers find a way to reduce contact resistance with molybdenum disulphide nanosheets

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(Phys.org) —A team of researchers with members from Rutgers University and Los Alamos National Laboratory has found a way to get around the problem of metals forming high-resistance when deposited on 2H phase molybdenum disulphide (MoS2). In their paper published in the journal Nature Materials, the team describes how they came up with a process for inducing 2H phase nanosheets to the metallic 1T phase, thereby reducing contact resistance.



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